Research of surface-oxidation epitaxy of NiO films on cube textured Ni tapes

Authors

Dongqi Shi, University of WollongongFollow
Mihail Ionescu, ANSTOFollow
Jeff McKinnon, University of WollongongFollow
Wu Ming Chen, University of Wollongong
S. X. Dou, University of WollongongFollow

RIS ID

7612

Publication Details

Shi, D., Ionescu, M., McKinnon, J., Chen, W. & Dou, S. X. (2002). Research of surface-oxidation epitaxy of NiO films on cube textured Ni tapes. In B. Balachandran, D. Gubser & K. Hartwig (Eds.), Proceedings of the International cryogenic materials Conference (pp. 525-530). New York: American Institute of Physics.

Abstract

Thin films of NiO were fabricated in air by surface-oxidation epitaxy (SOE) on biaxially-textured Ni substrate, for use as buffer layers for YBCO coated conductors. The surface-oxidation conditions such as the temperature and the reaction time, as well as the cooling rate, playa determining role in the process of epitaxial growth of the NiO layer. A continuous, biaxially-aligned textured NiO layer, was obtained for a 10 min oxidation in air at 1120°C,and acooling rate of 150 Klh. The roughness of the NiO layer is mostly controlled by a coarsening of some NiO grains .