Electrophoretic deposition of Ti3Si(Al)C2 from aqueous suspension

Authors

Ying Liang, Northeastern University
Ziqi Sun, Chinese Academy of SciencesFollow
Jixin Chen, Chinese Academy of Sciences
Xiaoxia Liu, Northeastern University
Yanchun Zho, Chinese Academy of Sciences

RIS ID

41653

Publication Details

Liang, Y., Sun, Z., Chen, J., Liu, X. & Zhou, Y. (2010). Electrophoretic deposition of Ti₃Si(Al)C₂ from aqueous suspension. Journal of the American Ceramic Society, 93 (7), 1916-1921.

Abstract

Ti₃Si(Al)C₂ films were electrophoretically deposited at 3 V on indium-tin-oxide (ITO) conductive glass from Ti₃Si(Al)C₂ aqueous suspension with 1 vol% solid loading at pH 9 in the absence of any dispersant. The surface morphology, cross section microstructure, and preferred orientation of the films were investigated by scanning electron microscopy and X-ray diffraction. The as-deposited Ti₃Si(Al)C₂ films exhibited (00l) preferred orientation and the thickness can be controlled by the deposition–drying–deposition method. These results demonstrate that electrophoretic deposition is a simple and feasible method to prepare MAX-phases green films at room temperature.