One-step electrodeposition of amorphous carbon films containing WO3 with high conductivity and good wettability

Authors

Deming Huang, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences
Shanhong Wan, Lanzhou Institute of Chemical Physics, Chinese Academy of SciencesFollow
Liping Wang, Lanzhou Institute of Chemical Physics, Chinese Academy of SciencesFollow
Qunji Xue, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences

RIS ID

105049

Publication Details

Huang, D., Wan, S., Wang, L. & Xue, Q. (2011). One-step electrodeposition of amorphous carbon films containing WO3 with high conductivity and good wettability. Surface and Interface Analysis, 43 (7), 1064-1068.

Abstract

Tungsten trioxide-incorporated hydrogenated amorphous carbon (WO 3/a-C:H) films have been fabricated on a single-crystal silicon wafer by liquid phase electrodeposition using methanol as carbon source and tungsten carbonyl as incorporated reagent. The morphology, composition and structure of the films have been investigated by SEM, XPS, Raman scattering spectroscopy, Fourier transform infrared spectroscopy (FTIR) and Transmission electron microscope (TEM), respectively. The effects of WO3 incorporation on the electrical and wetting properties were studied in detail. The characterization results showed that tungsten trioxide nanocrystalline particles with diameters in the range of 10-20 nm were homogenously embedded in the amorphous carbon films. Also, the electrical conductivity and wetting ability of the films were strongly improved due to the contribution of the tungsten trioxide.