Hydrothermal crystallization of amorphous titania films deposited using low temperature atomic layer deposition
RIS ID
82553
Abstract
A two stage process (atomic layer deposition, followed by hydrothermal treatment) for producing crystalline titania thin films at temperatures compatible with polymeric substrates (< 130°C) has been assessed. Titania thin films were deposited at 80°C using atomic layer deposition. They were extremely flat, uniform and almost entirely amorphous. They also contained relatively high levels of residual Cl from the precursor. After hydrothermal treatment at 120°C for 1 day, > 50% of the film had crystallized. Crystallization was complete after 10 days of hydrothermal treatment. Crystallization of the film resulted in the formation of coarse grained anatase. Residual Cl was completely expelled from the film upon crystallization. As a result of the amorphous to crystalline transformation voids formed at the crystallization front. Inward and lateral crystal growth resulted in voids being localized to the film/substrate interface and crystallite perimeters resulting in pinholing. Both these phenomena resulted in films with poor adhesion and film integrity was severely compromised.
Publication Details
Mitchell, D. RG., Triani, G. and Zhang, Z. (2008). Hydrothermal crystallization of amorphous titania films deposited using low temperature atomic layer deposition. Thin Solid Films, 516 (23), 8414-8423.