Tuning wall thicknesses in mesoporous silica films for optimization of optical anti-reflective properties

Authors

Nawfel Abdullah, University of WollongongFollow
Md. Shahriar Al Hossain, University of WollongongFollow
Konstantin K. Konstantinov, University of WollongongFollow
Hirofumi Tanabe, Kuraray Co. Ltd.
Mikiya Matsuura, Kuraray Co. Ltd.
Kazuhiko Maekawa, Kuraray Co. Ltd.
Amanullah Fatehmulla, King Saud University College of Science
Wazirzada Farooq, King Saud University College of Science
Md Tofazzal Islam, Bangabandhu Sheikh Mujibur Rahman Agricultural University
Yoshio Bando, National Institute For Materials ScienceFollow
Yusuf Valentino Kaneti, National Institute For Materials Science
Yusuke Yamauchi, University of WollongongFollow

RIS ID

118013

Publication Details

Abdullah, N., Hossain, M. A., Konstantinov, K., Tanabe, H., Matsuura, M., Maekawa, K., Fatehmulla, A., Farooq, W., Islam, M., Bando, Y., Kaneti, Y. & Yamauchi, Y. (2018). Tuning wall thicknesses in mesoporous silica films for optimization of optical anti-reflective properties. Journal of Nanoscience and Nanotechnology, 18 (1), 100-103.

Abstract

This work reports the fabrication of mesoporous silica films with controllable wall thicknesses by spin coating of precursor solutions consisting of polystyrene-block-polybutadiene-block-polystyrene based triblock copolymers (Hydrogenated methyl Styrene Ethylene Butadiene methyl Styrene, HmSEBmS) and tetraethyl orthosilicate (TEOS) followed by calcination in air at 600 °C, for optical anti-reflection films. By changing the relative weight of the triblock polymer to TEOS, the pore-Topore distance in the mesoporous silica film can be controlled without significantly affecting the size of the mesopores, thus, enabling effective control of the refractive index and porosity of the films. In terms of optical properties, the transmittance of the fabricated mesoporous silica film is approximately 3.3% higher than that of the uncoated glass substrate in the wavelength range of 400 to 750 nm.