Chemical Solution Deposition of Transparent and Metallic La0.5Sr0.5TiO3+x/2 Films Using Topotactic reduction

Authors

Xuebin Zhu, Chinese Academy Of SciencesFollow
Shoubao Zhang, Chinese Academy of Sciences
Hechang Lei, Chinese Academy of Sciences
Xiangde Zhu, Chinese Academy of Sciences
Gang Li, Chinese Academy of Sciences
Bosen Wang, Chinese Academy of Sciences
Wenhai Song, Chinese Academy of Sciences
zhaorong Yang, Chinese Academy of Sciences
Jianming Dai, Chinese Academy of Sciences
Yuping Sun, Materials Physics, Chinese Academy of Sciences
Dongqi Shi, University of WollongongFollow
S X. Dou, University of WollongongFollow

RIS ID

31413

Publication Details

Zhu, X, Zhang, S, Lei, H, Zhu, X, Li, G, Wang, B, Song, W, Yang, Z, Dai, J, Sun, Y, Shi, D & Dou, SX (2009), Chemical Solution Deposition of Transparent and Metallic La0.5Sr0.5TiO3+x/2 Films Using Topotactic reduction, Journal of the American Ceramic Society, 92(4), pp. 800-804.

Abstract

Metallic and transparent La_0.5Sr_0.5TiO_3+x/2 films were prepared by the chemical solution deposition (CSD) method using topotactic reduction processing. The use of Si powder as the reducing agent was facile and allowed easy manipulation. It was observed that metallic (resistivity at 300 K ∼2.43 mΩ cm) and transparent (∼80% transmittance at visible light) La_0.5Sr_0.5TiO_3+x/2 films could be obtained with an annealing temperature of 900°C, which was significantly lower than the hydrogen reduction temperature (∼1400°C). The successful preparation of metallic and transparent La_0.5Sr_0.5TiO_3+x/2 films using CSD has provided a feasible route for depositing other perovskite-structured functional layers on La_0.5Sr_0.5TiO_3+x/2 films using this low-cost all CSD method.