Title

Electrophoretic deposition of Ti3Si(Al)C2 from aqueous suspension

RIS ID

41653

Publication Details

Liang, Y., Sun, Z., Chen, J., Liu, X. & Zhou, Y. (2010). Electrophoretic deposition of Ti3Si(Al)C2 from aqueous suspension. Journal of the American Ceramic Society, 93 (7), 1916-1921.

Abstract

Ti3Si(Al)C2 films were electrophoretically deposited at 3 V on indium-tin-oxide (ITO) conductive glass from Ti3Si(Al)C2 aqueous suspension with 1 vol% solid loading at pH 9 in the absence of any dispersant. The surface morphology, cross section microstructure, and preferred orientation of the films were investigated by scanning electron microscopy and X-ray diffraction. The as-deposited Ti3Si(Al)C2 films exhibited (00l) preferred orientation and the thickness can be controlled by the deposition–drying–deposition method. These results demonstrate that electrophoretic deposition is a simple and feasible method to prepare MAX-phases green films at room temperature.

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Link to publisher version (DOI)

http://dx.doi.org/10.1111/j.1551-2916.2010.03682.x