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Synthesis and optimization of PEDOT:PSS based ink for printing nanoarrays using Dip-Pen Nanolithography

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posted on 2024-11-15, 07:38 authored by Michal Wagner, Cathal O'Connell, David Harman, Ryan Sullivan, Ari Ivaska, Michael HigginsMichael Higgins, Gordon WallaceGordon Wallace
Due to the current interest in organic printable electronics, Dip-Pen Nanolithography (DPN) is increasingly being explored as a method to pattern electroactive materials such as conducting polymers (CPs) on the micro- and nanoscale. In general, printing process depends strongly on the ink-substrate properties and fundamental forces required to drive and stabilize the ink transfer to the substrate. Controlling these parameters is especially difficult when operating under the nanometer confinements of the DPN probe. For the printing of CPs, one step towards addressing these challenges is rational ink design, as the use of existing commercial-based inks may not be suitable for the DPN ink transfer process on the nanoscale.

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Citation

Wagner, M., O'Connell, C., Harman, D. G., Sullivan, R., Ivaska, A., Higgins, M. J. & Wallace, G. G. (2013). Synthesis and optimization of PEDOT:PSS based ink for printing nanoarrays using Dip-Pen Nanolithography. Synthetic Metals, 181 (1 October), 64-71.

Journal title

Synthetic Metals

Volume

181

Pagination

64-71

Language

English

RIS ID

82937

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