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La and Nb codoped BiFeO3 multiferroic thin films on LaNiO3/Si and IrO2/Si substrates

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posted on 2024-11-15, 14:36 authored by Zhenxiang ChengZhenxiang Cheng, Xiaolin WangXiaolin Wang, Hideo Kimura, Kiyoshi Ozawa, Shi DouShi Dou
Nb and La codoped BiFeO3 thin films were fabricated on oxide bottom electrodes, LaNiO3/Si and IrO2/Si, by pulsed laser deposition method. The doped BiFeO3 thin film capacitor on LaNiO3showed a remnant polarization of more than 75 µC/cm2 in a saturated hysteresis loop. The same La and Nb codoped BiFeO3 thin film capacitors on IrO2 showed a larger remnant polarization, while with a significant contribution from the leakage current. Furthermore, the doped BiFeO3 capacitor on the LaNiO3 bottom electrode showed worse fatigue resistance than the film on IrO2. All the doped BiFeO3 thin films showed weak ferromagnetism at room temperature.

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Citation

Cheng, Z, Wang, X, Kimura, H, Ozawa, K & Dou, S (2008), La and Nb codoped BiFeO3 multiferroic thin films on LaNiO3/Si and IrO2/Si substrates, Applied Physics Letters, 92(9), pp. 092902-1-092902-3.

Journal title

Applied Physics Letters

Volume

92

Issue

9

Language

English

RIS ID

23017

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