A new approach for measuring the line-width enhancement factor

Authors

Yanguang Yu, University of WollongongFollow
Jiangtao Xi, University of WollongongFollow
Joe F. Chicharo, University of WollongongFollow
Yan Zhao, Zhengzhou University

RIS ID

25585

Publication Details

Yu, Y., Xi, J., Chicharo, J. F. & Zhao, Y. (2008). A new approach for measuring the line-width enhancement factor. International Conference on Intelligent Sensors, Sensor Networks and Information Processing (pp. 471-474). Sydney, Australia: IEEE.

Abstract

The paper presents a new approach for measuring the line-width enhancement factor (LEF) of semiconductor lasers (SLs). LEF can be measured using a technique called optical feedback self-mixing interferometry (OFSMI). However, the existing OFSMI based approaches require that optical feedback factor (denoted as C) associated with the SL systems within a narrow range. The proposed new method is also based on OFSMI principle. The method does not rely on the C factor, and is suitable for the whole moderate optical feedback regime. The associated simulations and the experiments are carried out for verifying the proposed method.