Fullerene attachment enhances performance of a DNA nanomachine

Authors

Su Ryon Shin, Hanyang University Seoul (Korea)
Kyeong Sik Jin, Pohang University of Sci and Tech
Chang Kee Lee, Hanyang University
Sun I. Kim, Hanyang University Seoul (Korea)
Geoffrey M. Spinks, University of WollongongFollow
Insuk So, Seoul National University
Ju-Hong Jeon, Seoul National Univeristy, Korea
Tong Mook Kang, Sungkyunkwan University, Korea
Ji Young Mun, Korea University, Korea
Sung-Sik Han, Korea University Seoul (Korea)
Moonhor Ree, Pohang University of Sci and Tech
Seon Jeong Kim, Hanyang University Seoul (Korea)

RIS ID

32325

Publication Details

Shin, S. Ryon., Jin, K. Sik., Lee, C. Kee., Kim, S. I., Spinks, G. Maxwell., So, I., Jeon, J., Kang, T. Mook., Mun, J. Young., Han, S., Ree, M. and Kim, S. Jeong. (2009). Fullerene attachment enhances performance of a DNA nanomachine. Advanced Materials, 21 (19), 1907-1910.

Abstract

Fullerene moieties are attached to single-strand DNA and the pH-induced conformational changes are evaluated in detail. It is found that fullerene attachments significantly enhance the machine performance of the DNA strand by stabilization of internal structure through intramolecular hydrophobic interactions.