Electrochemical deposition of sulfur doped DLC nanocomposite film at atmospheric pressure

Authors

Shanhong Wan, Lanzhou Institute of Chemical Physics, Chinese Academy of SciencesFollow
Liping Wang, Lanzhou Institute of Chemical Physics, Chinese Academy of SciencesFollow
Qunji Xue, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences

RIS ID

105054

Publication Details

Wan, S., Wang, L. & Xue, Q. (2010). Electrochemical deposition of sulfur doped DLC nanocomposite film at atmospheric pressure. Electrochemistry Communications, 12 (1), 61-65.

Abstract

Sulfur doped DLC nanocomposite film was fabricated on n-type silicon substrates by the electrochemical method using the mixture of methanol and thiofuran as the precursor. The synthesis and microstructure of the composite film was investigated. Compared with pure carbon film, sulfur doping effectively enhanced carbon film graphitization, and reduced the surface roughness, confirmed by XPS, Raman and AFM. In particular, XPS analysis revealed sulfur atoms among amorphous carbon matrix was in the form of organosulfur compounds. Furthermore, a novel but feasible growth mechanism was proposed following the synergism of thermochemistry, plasma chemistry and electrochemistry processes.