Preparation of thiol-terminated monolayers on silicon(100) surfaces using thioacetyl-protected alkynethiol

Authors

Cheuk Chi Albert Ng, University of New South Wales
Guillaume Le Saux, University of New South Wales
Muthukumar Chockalingam, University of New South Wales
Simone Ciampi, University of New South WalesFollow
Jason Brian Harper, University of New South Wales
J Justin Gooding, University of New South WalesFollow

RIS ID

105077

Publication Details

Ng, C. Chi Albert., Le Saux, G., Chockalingam, M., Ciampi, S., Harper, J. B. & Gooding, J. Justin. (2010). Preparation of thiol-terminated monolayers on silicon(100) surfaces using thioacetyl-protected alkynethiol. ICONN 2010 - Proceedings of the 2010 International Conference on Nanoscience and Nanotechnology (pp. 244-247). United States: Institute of Electrical and Electronics Engineers.

Abstract

The attachment of acetyl-protected alkynethiol groups onto silicon(100) surfaces was achieved using a hydrosilylation methodology. Subsequent deprotection of the thiols using either hydrochloric acid or ammonia solution was investigated using X-ray photoelectron spectroscopy (XPS), and compared with similar reaction in solution. It was found that ammonia solution was more efficient than hydrochloric acid for the deprotection step. However, the deprotection was much less efficient on the surface than in solution. 2010 IEEE.